T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdPbc-0924 Test methods for the optical

Test methods for the optical properties of 3D luminance

参照スタンダードおよび文書 （§4）

SEMI D20-1000 (technical revision)

thin film head

Although nanotopography measurements have not been needed for 0

T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdPbc-0924 Test methods for the opticalThis Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38. This Specification